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Controlled Deposition of Size-Selected Silver Nanoclusters
Karsten Bromann, Christian Félix, Harald Brune, Wolfgang Harbich, René Monot, Jean Buttet and Klaus Kern
New Series, Vol. 274, No. 5289 (Nov. 8, 1996), pp. 956-958
Published by: American Association for the Advancement of Science
Stable URL: http://www.jstor.org/stable/2891292
Page Count: 3
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Variable-temperature scanning tunneling microscopy was used to study the effect of kinetic cluster energy and rare-gas buffer layers on the deposition process of size-selected silver nanoclusters on a platinum(111) surface. Clusters with impact energies of ≤1 electron volt per atom could be landed nondestructively on the bare substrate, whereas at higher kinetic energies fragmentation and substrate damage were observed. Clusters with elevated impact energy could be soft-landed via an argon buffer layer on the platinum substrate, which efficiently dissipated the kinetic energy Nondestructive cluster deposition represents a promising method to produce monodispersed nano-structures at surfaces.
Science © 1996 American Association for the Advancement of Science